document: Control of thin film growth in chemical vapor deposition manufacturing systems : a feasibility study A study is carried out to design and optimize chemical vapor deposition -LRB- CVD -RRB- systems for material fabrication . Design and optimization of the CVD process is necessary to satisfying strong global demand and ever increasing quality requirements for thin film production . Advantages of computer aided optimization include high design turnaround time , flexibility to explore a larger design space and the development and adaptation of automation techniques for design and optimization . A CVD reactor consisting of a vertical impinging jet at atmospheric pressure , for growing titanium nitride films , is studied for thin film deposition . Numerical modeling and simulation are used to determine the rate of deposition and film uniformity over a wide range of design variables and operating conditions . These results are used for system design and optimization . The optimization procedure employs an objective function characterizing film quality , productivity and operational costs based on reactor gas flow rate , susceptor temperature and precursor concentration . Parameter space mappings are used to determine the design space , while a minimization algorithm , such as the steepest descent method , is used to determine optimal operating conditions for the system . The main features of computer aided design and optimization using these techniques are discussed in detail
doc_bio_tags: O O B I I O B I I O O O O O O O O O O O O O O O B I I O O O O O B I O O O B O O O O O O O O O O O O O O O O O O O O O O O O O B O O O O O O O O O O O O O O O O O O O O O O O O B O O O O O O O O O O O O O O O O B I I O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O B O O B O O O O O O B I O O O B I O O B I I I O B I O B I O B I I O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O B O O O O O O O
extractive_keyphrases: chemical vapor deposition material fabrication optimization operational costs film quality titanium nitride films thin film growth reactor gas flow rate susceptor temperature precursor concentration parameter space mappings
abstractive_keyphrases: tin